Newton Agham PhD Scholarship programme

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    13/09/2019 11:30 - Europe/London
    Not funded by an EU programme
    United Kingdom, Paisley
    University of the West of Scotland
    School of Computing, Engineering and Physical Sciences
    Institute of Thin Films, Sensors and Imaging (TFSI)

The Institute of Thin Films, Sensors and Imaging (TFSI) at the University of the West of Scotland (UWS), is keen to support excellent and outstanding candidates with high motivation, who are planning to submit applications for the Newton Agham PhD Scholarship programme in order to pursue a research career in UK. We invite applications from highly motived and qualified students within multidisciplinary backgrounds, including Material Science, Physics, Engineering, and Chemistry. The selected candidate will write a proposal for a Newton PhD studentship at TFSI together with Prof. Desmond Gibson and Dr. Carlos Garcia. This is an excellent opportunity to accelerate your research career while developing your skills in UWS which is one of the UK's most innovative modern universities and is ranked within the top 3% of universities worldwide.

Together with TFSI team, the selected candidates will start developing their Newton funding application towards the deadline of 13th September 2019. In this call, we search for talented young students within the field of Material Science, Physics, Engineering, and Chemistry interested to develop their careers in the field of Energy Systems, Smart Coatings, Optoelectronic Devices and Sensors based on Thin Film Technology.

Institute of Thin Films, Sensors and Imaging (TFSI)

The Institute of Thin Films, Sensors & Imaging, aka TFSI, is a centre of excellence and key laboratory in the UK for the development of thin film technology, deposition processes, as well as characterization and dissemination of information on the applications of thin films. The institute has received extensive funding support from EPSRC, Scottish Council, RSE, EU, and STFC, amongst others in the past 15 years, and has world-leading facilities for thin film deposition. The facilities comprise plasma enhanced e-beam deposition, magnetron sputtering systems (including DC, pulsed DC, RF, microwave systems), plasma enhanced chemical vapor deposition (RF, hollow cathode PECVD) and various advanced film characterization facilities, including state-of-the-art material characterization tools and metrology techniques. Institute researchers have strong expertise in thin film and plasma research, micro/nanoscale film/structure design, characterization/evaluation, micro-mechanics and nanotechnology. Institute facilities are unique within the academic community, providing necessary vacuum deposition capability to support institute specific and collaborative research.

More info visit TFSI.

Please send your CV (max 3 pages) and describe a research project that aligned with above themes (max 2 pages) to des.gibson@uws.ac.uk and carlos.garcianunez@uws.ac.uk as soon as possible, with the subject DOST-Newton-PhD followed by your name.


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